Multiphoton lithography inside a mesoporous host can create optical components with continuously tunable refractive indices in three-dimensional (3D) space. However, the process is very sensitive at exposure doses near the photoresist threshold, leading previous work to reliably achieve only a fraction of the available refractive index range for a given material system. Here, we present a method for greatly enhancing the uniformity of the subsurface micro-optics, increasing the reliable index range from 0.
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