Color etching is a useful corrosive process, widely applied in metallography to study the microstructure of metals. To prove the existence of the previously hypothesized steady-state etching rate, in-situ investigations were performed with spectroscopic ellipsometry during the color etching of ferritic materials. Kinetic information regarding the refractive index, extinction coefficient, and layer thickness were used to calculate the steady-state layer buildup rate, which was 1.
View Article and Find Full Text PDFMid-infrared (IR) ellipsometry of thin films and molecule layers at solid-liquid interfaces has been a challenge because of the absorption of light in water. It has been usually overcome by using configurations utilizing illumination through the solid substrate. However, the access to the solid-liquid interface in a broad spectral range is also challenging due to the limited transparency of most structural materials in the IR wavelength range.
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