Surface Photovoltage Study of Metal Halide Perovskites Deposited Directly on Crystalline Silicon.

Perovskite (PVK) films deposited directly on n-type crystalline Si substrates were investigated by two operating modes of the surface photovoltage (SPV) method: (i) the metal-insulator-semiconductor (MIS) mode and (ii) the Kelvin probe force microscopy (KPFM). By scanning from 900 to 600 nm in the MIS mode, we consecutively studied the relatively fast processes of carrier generation, transport, and recombination first in Si, then on both sides of the PVK/Si interface, and finally in the PVK layer and its surface. The PVK optical absorption edge was observed in the range of 1.