High-density gold nanowire arrays by lithographically patterned nanowire electrodeposition.

Here we describe a new method for preparing multiple arrays of parallel gold nanowires with dimensions and separation down to 50 nm. This method uses photolithography to prepare an electrode consisting of a patterned nickel film on glass, onto which a gold and nickel nanowire array is sequentially electrodeposited. After the electrodeposition, the nickel is stripped away, leaving behind a gold nanowire array, with dimensions governed by the gold electrodeposition parameters, spacing determined by the nickel electrodeposition parameters, and overall placement and shape dictated by the photolithography.