Enhanced Photodetection with Crystalline Si Nanoclusters.

SiO nanodots were fabricated on a TiO₂ thin film using glancing angle deposition technique. The fabricated samples were annealed at 950 °C in open air configuration to obtain Si nanoclusters resulting from phase separation of SiO nanodots. Field Emission Gun Scanning electron microscopy and atomic force microscopy were used to examine the topography of the samples.