We present a theoretical analysis of the different nanostructured plasmonic sensor chips-consisting of plasmonic nanostructures present on the surface of plasmonic thin films-interrogated using the Kretschmann configuration for highly sensitive localized sensing, with high tunability from the visible to the infrared regions. Rigorous coupled-wave analysis is performed to analyze all the proposed nanostructured sensor chips and compare their sensing performance. The sensitivity parameters are defined to focus on the detection of a thin layer of biomolecules on the surface of nanostructures.
View Article and Find Full Text PDFThis paper demonstrates a method to fabricate plasmonic nanostructures over a large area that can be implemented as SERS substrates. The proposed method comprises batch processes such as spin coating, reactive ion etching, and thin metal deposition. These processes can be performed on large wafers, resulting in large numbers of SERS substrates in a single run.
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