Effect of TiO Film Thickness on the Stability of Au Clusters with a CrO Layer.

Radio frequency (RF) magnetron sputtering allows the fabrication of TiO films with high purity, reliable control of film thickness, and uniform morphology. In the present study, the change in surface roughness upon heating two different thicknesses of RF sputter-deposited TiO films was investigated. As a measure of the process of the change in surface morphology, chemically -synthesised phosphine-protected Au clusters covered by a photodeposited CrO layer were used as a probe.

CrO layer inhibits agglomeration of phosphine-protected Au clusters on TiO films.

The properties of semiconductor surfaces can be modified by the deposition of metal clusters consisting of a few atoms. The properties of metal clusters and of cluster-modified surfaces depend on the number of atoms forming the clusters. Deposition of clusters with a monodisperse size distribution thus allows tailoring of the surface properties for technical applications.