Electrical and optical enhancement of ITO/Mo bilayer thin films via laser annealing.

ITO/Mo bilayer thin films were sputtered on n-type silicon and glass substrates and annealed with a Nd:YAG pulsed laser. The structural results show that both the as-deposited and the annealed ITO/Mo thin films have a polycrystalline structure, and that the annealing treatment enhanced the crystallinity of samples. Moreover, the XRD patterns exhibited a cubic structure preferentially oriented along the (222) and (400) planes.