Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis.

The PELIICAEN (Platform for the Study of Ion Implantation Controlled and Analyzed at the Nanometric Scale) setup is a unique device, both for all of its in situ ultra-high vacuum equipment (focused ion beam column, secondary electron microscope, atomic force microscope, and scanning tunneling microscope) and for its nanostructuration performances on materials. The setup has been recently equipped with its own electron cyclotron resonance ion sources, a new position-controlled platform using pneumatic vibration insulators, and a fast pulsing device. Its performances were then deeply improved, providing access to a large choice of ions, an adjustable ion implantation depth up to a few hundred nanometers, an image resolution down to 25 nm, and an ion beam size on the sample down to 100 nm.

Pantechnik new superconducting ion source: PantechniK Indian Superconducting Ion Source.

The new ECR ion source PantechniK Indian Superconducting Ion Source (PKISIS) was recently commissioned at Pantechnik. Three superconducting coils generate the axial magnetic field configuration, while the radial magnetic field is done with the multi-layer permanent magnets. Special care was devoted to the design of the hexapolar structure, allowing a maximum magnetic field of 1.

Microgan electron cyclotron resonance ion source in a Van de Graaff accelerator terminal.

The Van de Graaff accelerator at IRMM works since many years providing proton, deuteron, and helium beams for nuclear data measurements. The original ion source was of RF type with quartz bottle. This kind of source, as well known, needs regular maintenance for which the accelerator tank must be completely opened.