Nanocomposites based on CuO coated silver nanowire networks for high-performance oxygen evolution reaction.

The development of highly active, low-cost, and robust electrocatalysts for the oxygen evolution reaction (OER) is a crucial endeavor for the clean and economically viable production of hydrogen electrochemical water splitting. Herein, cuprous oxide (CuO) thin films are deposited on silver nanowire (AgNW) networks by atmospheric-pressure spatial atomic layer deposition (AP-SALD). AgNW@CuO nanocomposites supported on conductive copper electrodes exhibited superior OER activity as compared to bare copper substrate and bare AgNWs.

Pes anserine bursitis as a complication of tibial osteochondroma.

Exostosis, or osteochondroma, represents the most prevalent primary benign bone tumor, often viewed as a developmental anomaly rather than a true neoplasm. This article presents 2 cases illustrating complications associated with tibial osteochondroma. The first case involves a 25-year-old patient with recurrent medial knee pain attributed to pes anserine bursitis secondary to tibial osteochondroma, managed successfully with surgical excision.

Ileal intussusception secondary to lipoma in an adult patient: A rare cause for intestinal obstruction: A case report.

Intussusception is a rare condition in adults, unlike in children, with a variety of etiologies. In most cases, it is secondary to tumors. acute intussusception on lipoma is very exceptional.

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It.

Due to concerns on resources depletion, climate change, and overall pollution, the quest toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a versatile technology, allowing for the precise coating of challenging substrates with a nanometer control over thickness. Due to its unique ability to nanoengineer interfaces and surfaces, ALD is widely used in many applications.

Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

Fine control over the growth of materials is required to precisely tailor their properties. Spatial atomic layer deposition (SALD) is a thin-film deposition technique that has recently attracted attention because it allows producing thin films with a precise number of deposited layers, while being vacuum-free and much faster than conventional atomic layer deposition. SALD can be used to grow films in the atomic layer deposition or chemical vapor deposition regimes, depending on the extent of precursor intermixing.