Thermomechanical modification of diffraction gratings.

The most accurate approaches to fabrication of diffraction gratings are known to be the lithographic and holographic methods. The lithographic methods allow fabrication of arbitrarily chirped gratings whose performance, however, is degraded by stitching errors. The holographic methods are free from stitching errors; however, they are limited in the achievable spatial variations of their grating periods.

Epitaxial cubic gadolinium oxide as a dielectric for gallium arsenide passivation.

Epitaxial growth of single-crystal gadolinium oxide dielectric thin films on gallium arsenide is reported. The gadolinium oxide film has a cubic structure isomorphic to manganese oxide and is (110)-oriented in single domain on the (100) gallium arsenide surface. The gadolinium oxide film has a dielectric constant of approximately 10, with low leakage current densities of about 10(-9) to 10(-10) amperes per square centimeter at zero bias.