Flux and fluence effects on the vacuum-UV photodesorption and photoprocessing of CO ices.

CO is a major component of the icy mantles surrounding dust grains in planet and star formation regions. Understanding its photodesorption is crucial for explaining gas phase abundances in the coldest environments of the interstellar medium irradiated by vacuum-UV (VUV) photons. Photodesorption yields determined experimentally from CO samples grown at low temperatures ( = 15 K) have been found to be very sensitive to experimental methods and conditions.

Low-energy electron interaction with 2-(trifluoromethyl)acrylic acid, a potential component for EUVL resist material.

Motivated by the current introduction of extreme ultraviolet lithography (EUVL) into chip manufacturing processes, and thus the transition to electron-induced chemistry within the respective resist materials, we have studied low energy electron-induced fragmentation of 2-(trifluoromethyl)acrylic acid (TFMAA). This compound is chosen as a potential resist component, whereby fluorination enhances the EUV adsorption and may at the same time promote electron-induced dissociation. Dissociative ionization and dissociative electron attachment are studied, and to aid the interpretation of the observed fragmentation channels, the respective threshold values are calculated at the DFT and coupled cluster level of theory.

Cryogenic Chemistry and Quantitative Non-Thermal Desorption from Pure Methanol Ices: High-Energy Electron versus X-Ray Induced Processes.

X-Ray irradiation of interstellar ice analogues has recently been proven to induce desorption of molecules, thus being a potential source for the still-unexplained presence of gaseous organics in the coldest regions of the interstellar medium, especially in protoplanetary disks. The proposed desorption mechanism involves the Auger decay of excited molecules following soft X-ray absorption, known as X-ray induced electron-stimulated desorption (XESD). Aiming to quantify electron induced desorption in XESD, we irradiated pure methanol (CH OH) ices at 23 K with 505 eV electrons, to simulate the Auger electrons originating from the O 1s core absorption.

Indirect x-ray photodesorption of N215 and CO13 from mixed and layered ices.

X-ray photodesorption yields of N215 and CO13 are derived as a function of the incident photon energy near the N (∼400 eV) and O K-edge (∼500 eV) for pure N215 ice and mixed CO13:N215 ices. The photodesorption spectra from the mixed ices reveal an indirect desorption mechanism for which the desorption of N215 and CO13 is triggered by the photoabsorption of CO13 and N215, respectively. This mechanism is confirmed by the x-ray photodesorption of CO13 from a layered CO13/N215 ice irradiated at 401 eV on the N 1s → π* transition of N215.

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography.

Secondary electrons generated during the Extreme Ultraviolet Lithography (EUVL) process are predominantly responsible for inducing important patterning chemistry in photoresist films. Therefore, it is crucial to understand the electron-induced fragmentation mechanisms involved in EUV-resist systems to improve their patterning performance. To facilitate this understanding, mechanistic studies were carried out on simple organic EUV-resist monomers, methyl isobutyrate (MIB) and methacrylic acid (MAA), both in the condensed and gas phases.