Dual-beam X-ray nano-holotomography.

Nanotomography with hard X-rays is a widely used technique for high-resolution imaging, providing insights into the structure and composition of various materials. In recent years, tomographic approaches based on simultaneous illuminations of the same sample region from different angles by multiple beams have been developed at micrometre image resolution. Transferring these techniques to the nanoscale is challenging due to the loss in photon flux by focusing the X-ray beam.

Electron population dynamics in resonant non-linear x-ray absorption in nickel at a free-electron laser.

Free-electron lasers provide bright, ultrashort, and monochromatic x-ray pulses, enabling novel spectroscopic measurements not only with femtosecond temporal resolution: The high fluence of their x-ray pulses can also easily enter the regime of the non-linear x-ray-matter interaction. Entering this regime necessitates a rigorous analysis and reliable prediction of the relevant non-linear processes for future experiment designs. Here, we show non-linear changes in the -edge absorption of metallic nickel thin films, measured with fluences up to 60 J/cm.

Hard X-ray full-field nanoimaging using a direct photon-counting detector.

Full-field X-ray nanoimaging is a widely used tool in a broad range of scientific areas. In particular, for low-absorbing biological or medical samples, phase contrast methods have to be considered. Three well established phase contrast methods at the nanoscale are transmission X-ray microscopy with Zernike phase contrast, near-field holography and near-field ptychography.

Slope error correction on X-ray reflection gratings by a variation of the local line density.

The patterning of x-ray grating surfaces by electron-beam lithography offers large flexibility to realize complex optical functionalities. Here, we report on a proof-of-principle experiment to demonstrate the correction of slope errors of the substrates by modulating the local density of the grating lines. A surface error map of a test substrate was determined by optical metrology and served as the basis for an aligned exposure of a corrected grating pattern made by electron-beam lithography.

Rapid aberration correction for diffractive X-ray optics by additive manufacturing.

Diffraction-limited hard X-ray optics are key components for high-resolution microscopy, in particular for upcoming synchrotron radiation sources with ultra-low emittance. Diffractive optics like multilayer Laue lenses (MLL) have the potential to reach unprecedented numerical apertures (NA) when used in a crossed geometry of two one-dimensionally focusing lenses. However, minuscule fluctuations in the manufacturing process and technical limitations for high NA X-ray lenses can prevent a diffraction-limited performance.