The precursor nanoparticles of nickel hydroxide (Ni(OH)) and nickel oxide (NiO) were successfully converted into the latter by the reaction of nickel chloride with hydrazine at ambient temperature. (TGA) and (DSC) were adapted for annealing the precursor products at different annealing temperatures (210, 285, 350, 390, 425, and 450 °C). XRD, TEM, and UV-VIS absorption spectroscopy were used to characterize the products.
View Article and Find Full Text PDFThe development of nanotechnology has significantly impacted the improvement of photocatalytic performance of ZnO NPs. In this study synthesis of pure ZnO and Ag-ZnO nanoparticles via a co-precipitation method at varying Ag concentrations (1 %, 2 %, 3 %, 4 % and 6 %) to enhance their photo catalytic efficacy. X-ray diffraction (XRD) analysis estimates crystallite size which decreased by increasing Ag concentration, ranging from 30.
View Article and Find Full Text PDFA new class of liquid crystalline materials, 4-(2,5-dioxo-2,5-dihydro-1-pyrrol-1-yl)phenyl 4-(alkoxy)benzoates (Mn), derived from maleic anhydride, was synthesized and studied for mesomorphic and optical properties. These materials consist of three derivatives with varying terminal flexible chain lengths (6-12 carbons) linked to the phenyl ring near the ester bond. The study employed differential scanning calorimetry and polarized optical microscopy (POM) to characterize the mesomorphic properties.
View Article and Find Full Text PDFCurrently, hydrogen generation via photocatalytic water splitting using semiconductors is regarded as a simple environmental solution to energy challenges. This paper discusses the effects of the doping of noble metals, Ir (3.0 at.
View Article and Find Full Text PDFAn aluminum oxide, AlO, template is prepared using a novel Ni imprinting method with high hexagonal pore accuracy and order. The pore diameter after the widening process is about 320 nm. TiO layer is deposited inside the template using atomic layer deposition (ALD) followed by the deposition of 6 nm TiN thin film over the TiO using a direct current (DC) sputtering unit.
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